Atomic Layer Deposition - Principles, Characteristics, and Nanot

Atomic Layer Deposition - Principles, Characteristics, and Nanotechnology Applications 2nd ed - T. Kääriäinen et al. (Wiley-Scrivener, 2013).pdf

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials